Den Boef is professor of Metrology and Nanolithography and an expert in the metrology and alignment processes that play such an important role in the ambition to optimize computer chip technology. At ARCNL den Boef and his team are exploring computational imaging techniques to improve optical metrology without using expensive and high-quality optics. In this approach the optical sensor produces imperfect images and smart algorithms are used to correct for the image imperfections.
Arie den Boef is professor of Metrology and Nanolithography at Vrije Universiteit Amsterdam, works at ASML and ARCNL and closely collaborates on Digital Holographic imaging with the VU Physics department
Credits picture: ACRNL