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VERSION:2.0
PRODID:-//Vrije Universiteit Amsterdam//NONSGML v1.0//EN
NAME:PhD defense S.J.J. de Lange
METHOD:PUBLISH
BEGIN:VEVENT
DTSTART:20261123T134500
DTEND:20261123T151500
DTSTAMP:20261123T134500
UID:phd-defense-s-j-j-de-lange@8F96275E-9F55-4B3F-A143-836282E12573
CREATED:20261022T002605
LOCATION:Main building VU, 1105, Auditorium, De Boelelaan, 1081 HV, Amsterdam
SUMMARY:PhD defense S.J.J. de Lange
X-ALT-DESC;FMTTYPE=text/html: <html> <body> <p><p>Simulation of Tin Pl
 asmas &amp; Theory of Laser Light Absorption</p></p> <p>Computer chip
 s are desperately needed in our society. The first step of making com
 puter chips is to bombard slices of silicone with extreme ultraviolet
  (EUV) light; This is called (nano)lithography. Science is therefore 
 looking for more efficient nanolithography techniques.<br><br>I used 
 computer simulations to investigate a new technique of producing EUV 
 light. I looked at the amount of light that is produced, but also at 
 the emission of harmful ions. These results are now being checked in 
 the lab.<br><br>In addition, I have done theoretical research into ab
 sorption of laser light in a plasma. Plasma electrons in a light fiel
 d behave differently than is often heard, and this affects the streng
 th of light absorption. By carefully calculating this, I have derived
  a new formula that better describes light absorption. This result is
  not only interesting for (future) lithography techniques, but also f
 or nuclear fusion.</p><p>My simulations show that EUV production by m
 eans of a long light pulse can in principle generate more energy than
  the current technique. By producing more EUV per drop of tin, comput
 er chips can be made even faster. However, this also produces more hi
 gh-energy ions, and these can reduce the efficiency of the machine ov
 er time; this must be taken into account in practice.<br><br>My theor
 etical research on light absorption shows that the behaviour of plasm
 a electrons in a light field can be taken into account quite easily i
 n calculations of light absorption. The influence of light leads to a
  simple change of one quantity: the so-called Coulomblogarithm. All i
 n all, we expect: the stronger the light, the less absorption takes p
 lace.</p><p>If this new technique also proves useful in practice, it 
 could mean a faster way of producing computer chips for the chip indu
 stry. And faster production means greater supply and therefore lower 
 prices.</p><p>More information on the thesis to follow.</p> </body> <
 /html>
DESCRIPTION: Simulation of Tin Plasmas &amp; Theory of Laser Light Abs
 orption Computer chips are desperately needed in our society. The fir
 st step of making computer chips is to bombard slices of silicone wit
 h extreme ultraviolet (EUV) light; This is called (nano)lithography. 
 Science is therefore looking for more efficient nanolithography techn
 iques.<br><br>I used computer simulations to investigate a new techni
 que of producing EUV light. I looked at the amount of light that is p
 roduced, but also at the emission of harmful ions. These results are 
 now being checked in the lab.<br><br>In addition, I have done theoret
 ical research into absorption of laser light in a plasma. Plasma elec
 trons in a light field behave differently than is often heard, and th
 is affects the strength of light absorption. By carefully calculating
  this, I have derived a new formula that better describes light absor
 ption. This result is not only interesting for (future) lithography t
 echniques, but also for nuclear fusion.My simulations show that EUV p
 roduction by means of a long light pulse can in principle generate mo
 re energy than the current technique. By producing more EUV per drop 
 of tin, computer chips can be made even faster. However, this also pr
 oduces more high-energy ions, and these can reduce the efficiency of 
 the machine over time; this must be taken into account in practice.<b
 r><br>My theoretical research on light absorption shows that the beha
 viour of plasma electrons in a light field can be taken into account 
 quite easily in calculations of light absorption. The influence of li
 ght leads to a simple change of one quantity: the so-called Coulomblo
 garithm. All in all, we expect: the stronger the light, the less abso
 rption takes place.If this new technique also proves useful in practi
 ce, it could mean a faster way of producing computer chips for the ch
 ip industry. And faster production means greater supply and therefore
  lower prices.More information on the thesis to follow.
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