BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//Vrije Universiteit Amsterdam//NONSGML v1.0//EN
NAME:Colloquium with Paul Jansen from ASML Research
METHOD:PUBLISH
BEGIN:VEVENT
DTSTART:20260507T123000
DTEND:20260507T141500
DTSTAMP:20260507T123000
UID:colloquium-with-paul-jansen-fr@8F96275E-9F55-4B3F-A143-836282E12573
CREATED:20260824T075303
LOCATION:
SUMMARY:Colloquium with Paul Jansen from ASML Research
X-ALT-DESC;FMTTYPE=text/html: <html> <body> <p><p>Colloquium with Paul
  Jansen from ASML Research and Zainab Rashid, Physics of Living Syste
 ms, VU Amsterdam</p></p> <p><strong>12:30 - 12:50 Zainab Rashid, Post
 Doc, Physics of Living Systems, VU Amsterdam</strong></p><p><strong>T
 itle: TAV2b Peptide Derivatives Underwind and Stabilize Double- Stran
 ded RNA upon Binding</strong></p><p><strong>Abstract:</strong> Double
 -stranded RNA (dsRNA) has become an essential tool to understand biol
 ogical processes with promising therapeutic implications. However, it
 s usage is often limited due to poor cellular uptake and instability 
 in biological settings. Peptidic dsRNA binders, inspired by natural R
 NA-binding proteins, have emerged as promising tools to address these
  limitations. However, it remains unclear how these peptides recogniz
 e RNA and impact its mechanical properties. Here we employed single-m
 olecule magnetic tweezers to investigate TAV2b-derived peptidic dsRNA
  binders. We showed that these peptides underwind dsRNA upon binding 
 and stabilize the resulting dsRNA conformation. Additionally, the wil
 d-type peptide increases the dsRNA contour length while significantly
  lowering the persistence length. In contrast, a high-affinity homodi
 meric derivative condenses the dsRNA tether at forces below 1 pN.</p>
 <p>Furthermore, real-time experiments performed to understand the bin
 ding mechanism of TAV2b-derived peptides showed that the wild-type de
 rivative is in dynamic association with dsRNA, whereas the homodimeri
 c version forms a stable complex with dsRNA. Based on these findings,
  we propose a two-step equilibrium model where the RNA fluctuates bet
 ween double-stranded and melted conformations, followed by peptide bi
 nding, which results in plectonemes. Our approach can inform the desi
 gn of more potent and effective dsRNA binders for therapeutic and dia
 gnostic applications.</p><p><strong>12:50 -13:45 &nbsp;Paul Jansen fr
 om ASML Research, Veldhoven</strong></p><p><strong>Title:&nbsp; Plasm
 a Interactions in EUV Lithography Machines</strong></p><p><strong>Abs
 tract:&nbsp;</strong>EUV scanners operate in a low‑pressure hydroge
 n environment in which each exposure pulse generates a short‑lived 
 EUV‑induced plasma. While this plasma helps mitigate carbon contami
 nation, it simultaneously drives a range of surface, chemical, and ch
 arging phenomena that influence material durability and particulate c
 ontamination (defectivity).</p><p>In this colloquium, I will examine 
 how EUV‑induced hydrogen plasmas form and evolve, how they interact
  with materials, and how they affect particulate charging and release
 . I will show that this plasma acts as a double‑edged sword: on one
  hand its properties are deliberately exploited to keep optical surfa
 ces clean and to manage charge accumulation, while on the other hand 
 it introduces mechanisms that complicate reliable high‑volume manuf
 acturing.</p><p>The aim is to provide a physics‑based perspective o
 n how transient EUV‑driven plasmas shape scanner performance throug
 h their impact on materials and reticles, and why understanding these
  interactions – both in laboratory setups and&nbsp;<em>in situ</em>
 &nbsp;- is essential for robust next‑generation chip production.</p
 > </body> </html>
DESCRIPTION: Colloquium with Paul Jansen from ASML Research and Zainab
  Rashid, Physics of Living Systems, VU Amsterdam <strong>12:30 - 12:5
 0 Zainab Rashid, PostDoc, Physics of Living Systems, VU Amsterdam</st
 rong><strong>Title: TAV2b Peptide Derivatives Underwind and Stabilize
  Double- Stranded RNA upon Binding</strong><strong>Abstract:</strong>
  Double-stranded RNA (dsRNA) has become an essential tool to understa
 nd biological processes with promising therapeutic implications. Howe
 ver, its usage is often limited due to poor cellular uptake and insta
 bility in biological settings. Peptidic dsRNA binders, inspired by na
 tural RNA-binding proteins, have emerged as promising tools to addres
 s these limitations. However, it remains unclear how these peptides r
 ecognize RNA and impact its mechanical properties. Here we employed s
 ingle-molecule magnetic tweezers to investigate TAV2b-derived peptidi
 c dsRNA binders. We showed that these peptides underwind dsRNA upon b
 inding and stabilize the resulting dsRNA conformation. Additionally, 
 the wild-type peptide increases the dsRNA contour length while signif
 icantly lowering the persistence length. In contrast, a high-affinity
  homodimeric derivative condenses the dsRNA tether at forces below 1 
 pN.Furthermore, real-time experiments performed to understand the bin
 ding mechanism of TAV2b-derived peptides showed that the wild-type de
 rivative is in dynamic association with dsRNA, whereas the homodimeri
 c version forms a stable complex with dsRNA. Based on these findings,
  we propose a two-step equilibrium model where the RNA fluctuates bet
 ween double-stranded and melted conformations, followed by peptide bi
 nding, which results in plectonemes. Our approach can inform the desi
 gn of more potent and effective dsRNA binders for therapeutic and dia
 gnostic applications.<strong>12:50 -13:45 &nbsp;Paul Jansen from ASML
  Research, Veldhoven</strong><strong>Title:&nbsp; Plasma Interactions
  in EUV Lithography Machines</strong><strong>Abstract:&nbsp;</strong>
 EUV scanners operate in a low‑pressure hydrogen environment in whic
 h each exposure pulse generates a short‑lived EUV‑induced plasma.
  While this plasma helps mitigate carbon contamination, it simultaneo
 usly drives a range of surface, chemical, and charging phenomena that
  influence material durability and particulate contamination (defecti
 vity).In this colloquium, I will examine how EUV‑induced hydrogen p
 lasmas form and evolve, how they interact with materials, and how the
 y affect particulate charging and release. I will show that this plas
 ma acts as a double‑edged sword: on one hand its properties are del
 iberately exploited to keep optical surfaces clean and to manage char
 ge accumulation, while on the other hand it introduces mechanisms tha
 t complicate reliable high‑volume manufacturing.The aim is to provi
 de a physics‑based perspective on how transient EUV‑driven plasma
 s shape scanner performance through their impact on materials and ret
 icles, and why understanding these interactions – both in laborator
 y setups and&nbsp;<em>in situ</em>&nbsp;- is essential for robust nex
 t‑generation chip production.
END:VEVENT
END:VCALENDAR
